Process for treatment by a beam of mono- or multicharged ions of a gas to produce antireflective glass materials

A durable antireflective treating process for rendering a glass material antireflective to an incident light wave having a wavelength in a visible light range, comprising:

• treating the glass material by a bombardment by a beam of mono- and multicharged ions of a gas which are produced by an electron cyclotron resonance (ECR) source where:
• the temperature for treatment of the glass material is less than or equal to the glass transition temperature;
• the dose of mono- and multicharged ions of a gas which are implanted per unit of surface area is chosen within a range of between 1012 ions/cm2 and 1018 ions/cm2 so as to obtain an atomic concentration of mono- and multicharged ions of a gas such that the refractive index n of the implanted layer is approximately equal to (n1*n2)1/2, where n1 is the index of the air and n2 is the index of the glass;
• the acceleration voltage is chosen within a range of between 5 kV and 1000 kV so as to obtain an implanted thickness t equal to p*λ/4*n, where t is the implanted thickness corresponding to a region of implantation where the atomic concentration of implanted mono- and multicharged ions of a gas is greater than or equal to 1%, p is an integer, λ is the wavelength of the incident light wave, expressed in nanometers, and n is the index of the implanted layer.