Method for producing pattern laminate, method for producing reversal pattern, and pattern laminate

A method for producing a pattern laminate, comprising:

• forming a first layer having a pattern on an object to be processed;
• and
• forming a second layer on the first layer,
• wherein the glass transition temperature of the first layer is 100° C. or higher,
• the forming of a first layer includes forming a first layer by an imprint method using a first curable composition comprising a polymerizable compound having an ethylenically unsaturated bond-containing group,
• a proportion of the polymerizable compound having an ethylenically unsaturated bond-containing group which includes an aliphatic ring having a crosslinked structure, with respect to all polymerizable compounds included in the first curable composition, is less than 15% by mass,
• a proportion of a polymerizable compound having two ethylenically unsaturated bond-containing groups with respect to all polymerizable compounds included in the first curable composition is 50% or more by mass,
• a proportion of a polymerizable compound having one ethylenically unsaturated bond-containing group with respect to all polymerizable compounds included in the first curable composition is 10 to 35% by mass,
• an Onishi parameter of the first curable composition is less than 3.8,
• the second layer includes a Si atom-containing compound or a metal, and
• the forming of a second layer includes forming a second layer by curing a second curable composition including a Si atom-containing compound in a case where the second layer includes the Si atom-containing compound.