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US 11,029,596 B2Granted
Film mask, method for manufacturing same, and method for forming pattern using film mask and pattern formed thereby
AssigneeLG Chem, Ltd.
InventorsJi Young Hwang, Han Min Seo, Nam Seok Bae, Seung Heon Lee, Dong Hyun Oh, Jungsun You
Life of this patent
Estimating the term…