Substrate with antireflection coating and method for producing same

A coated sapphire glass substrate, comprising:

• a substrate with a first side and a second side;
• an aluminum-containing silicon dioxide layer on at least one of the first and/or second sides of the substrate;
• and
• a multilayer anti-reflection coating on the aluminum-containing silicon oxide layer, wherein the multilayer antireflection coating comprises at least four successive layers and is composed of layers with different refractive indices, wherein layers having a higher refractive index alternate with layers having a lower refractive index, wherein the layers having a lower refractive index are formed of silicon oxide with a proportion of aluminum, and wherein the layers having a higher refractive index are silicon nitride-containing layers,
• wherein the multilayer anti-reflection coating is a high-power impulse magnetron sputtered coating having an average roughness and a root mean squared roughness of less than 1.5 nanometers each, based on an area of one square micrometer.

A coated sapphire glass substrate, comprising:

• a substrate with a first side and a second side;
• an aluminum-containing silicon dioxide layer on at least one of the first and/or second sides of the substrate;
• a multilayer anti-reflection coating on the aluminum-containing silicon oxide layer;
• and
• a Haze value after a Bayer test increases less than 2.5%,
• wherein the multilayer antireflection coating comprises at least four successive layers and is composed of layers with different refractive indices,
• wherein layers having a higher refractive index alternate with layers having a lower refractive index,
• wherein the layers having the lower refractive index are formed of silicon oxide with a proportion of aluminum,
• wherein the multilayer anti-reflection coating reduces reflectance of the substrate by more than 3% throughout an entirety of a wavelength range from 400 nm to at least 700 nm, and
• wherein the layers having the higher refractive index are silicon nitride-containing layers.