Thin films and a method for making the same
AssigneeOregon State University
InventorsCory K. Perkins, Ryan Helmut Mansergh, Juan Carlos Ramos, Douglas A. Keszler
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Abstract
Disclosed herein are embodiments of a porous aluminum oxide thin film having a surface RMS roughness value of less than 1 nm. The thin film may also comprise phosphorus. The disclosed thin films may have a refractive index of from 1 to 2, such as from 1 to 1.5. Also disclosed are embodiments of as method for making the disclosed thin films, comprising forming an aqueous solution of the alumina precursor, a surfactant and optionally a phosphorus-containing precursor, and depositing the solution on a substrate.
Claims19
A substrate with a porous aluminum oxide film disposed thereon, comprising:
- the substrate;
- and
- the porous aluminum oxide film, comprising a surface having a root mean square roughness value of from greater than zero to 1 nm and an index of refraction of from 1 to less than 1.5 at 550 nm.
A substrate with a porous aluminum oxide film disposed thereon, comprising:
- the substrate;
- and
- the porous aluminum oxide film, comprising a surface having a root mean square roughness value of from greater than zero to 1 nm, and wherein the film comprises a P:Al ratio of from greater than zero:1 to 3:1.
A method, comprising
- forming a first aqueous solution comprising a first alumina precursor and a first surfactant;
- depositing the first aqueous solution on a substrate to form a first film;
- and
- exposing the substrate to an annealing temperature to form a porous aluminum oxide thin film having a root mean square roughness value of from greater than zero to 1 nm.
Dependencies are inferred from the claim text.