Hall element for mitigating current concentration and fabrication method thereof
AssigneeAsahi Kasei Microdevices Corporation
InventorsTsuyoshi Akagi, Tetsuya Takahashi
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AssigneeAsahi Kasei Microdevices Corporation
InventorsTsuyoshi Akagi, Tetsuya Takahashi
Estimating the term…
A Hall element including a contact is provided. A Hall element is provided, including: a substrate; a magnetosensitive portion formed on the substrate; an insulating film formed on the magnetosensitive portion; and a conductive portion which is formed on the insulating film, extends from a peripheral region of the magnetosensitive portion toward a central region of the magnetosensitive portion, penetrates the insulating film, and is electrically connected to the magnetosensitive portion, wherein when observing a cross section passing through a center of the magnetosensitive portion in plan view and a portion at which the conductive portion is in contact with the magnetosensitive portion, at least a part of the conductive portion extends below the insulating film in the cross section.
A Hall element, comprising:
A fabrication method of a Hall element, comprising:
Dependencies are inferred from the claim text.