Methods and apparatus for waveguide metrology
AssigneeApplied Materials, Inc.
InventorsJinxin Fu, Rutger Meyer Timmerman Thijssen, Ludovic Godet
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AssigneeApplied Materials, Inc.
InventorsJinxin Fu, Rutger Meyer Timmerman Thijssen, Ludovic Godet
Estimating the term…
Embodiments described herein relate to apparatus for measuring and characterizing performance of augmented and virtual reality waveguide structures utilizing glass substrates. The waveguide performance measuring systems generally include a light source configured to direct light towards an incoupling grating area on waveguide and one or more light detectors configured to collect light from an outcoupling grating area on a second side of the waveguide. The light source and one or more light detectors are disposed on one or more adjustable stages positioned about the waveguide. In certain embodiments, the one or more adjustable stages are configured to move in a linear fashion or revolve and/or rotate around the waveguide in an orbital motion.
A waveguide metrology system, comprising:
A waveguide metrology system, comprising:
A waveguide metrology system, comprising:
Dependencies are inferred from the claim text.