Method for preventing vacuum pump pipeline from blockage, and chemical vapor deposition machine
AssigneeHkc Corporation Limited
InventorJianfeng Shan
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AssigneeHkc Corporation Limited
InventorJianfeng Shan
Estimating the term…
The present disclosure relates to the technical field of chemical vapor deposition coating equipment, and discloses a method for preventing vacuum pump pipeline from blockage, which includes the following steps: opening a gas source, and introducing reaction gas into a process chamber from the gas source; carrying out a coating reaction of a chemical vapor deposition machine in the process chamber; after coating, closing the gas source, and introducing heated inert gas into an air exhaust pipe connected to an outlet of a vacuum pump; turning on the vacuum pump, and introducing dust and exhaust gas in the process chamber into a exhaust gas treatment device through the air exhaust pipe. The present disclosure also provides a chemical vapor deposition machine applying the method for preventing the vacuum pump pipeline from blockage.
A method for preventing a vacuum pump pipeline from blockage, comprising the following steps:
A chemical vapor deposition machine, comprising a vacuum pump, a process chamber, and an exhaust gas treatment device, an air inlet pipe being connected with the vacuum pump and the process chamber therebetween, and an air exhaust pipe being connected with the exhaust gas treatment device and the vacuum pump therebetween, wherein, one end of the air exhaust pipe near the vacuum pump communicates with a gas tube which is configured to fill inert gas into the air exhaust pipe, the gas tube defines a first heating device, and the chemical vapor deposition machine is defined to prevent the vacuum pump pipe from blockage, comprising the following operations:
A chemical vapor deposition machine, comprising a vacuum pump, a process chamber, and an exhaust gas treatment device, an air inlet pipe being connected with the vacuum pump and the process chamber therebetween, and an air exhaust pipe being connected with the exhaust gas treatment device and the vacuum pump therebetween, wherein, the chemical vapor deposition machine further comprises:
Dependencies are inferred from the claim text.