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US 11,027,481 B2Granted
Method for treating millimetre and/or micrometre and/or nanometre structures on a surface of a substrate
AssigneeEV Group E. Thallner GmbH
InventorGerald Mittendorfer
Life of this patent
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Abstract
A method for treating a substrate having millimeter and/or micrometer and/or nanometer structures. The method includes applying at least one protective material to the structures, wherein the at least one protective material can be dissolved in a solvent, and the structures are produced by an imprinting process.
Claims16
A method for treating a substrate having a first surface and a second surface, wherein the method comprises:
- providing a substrate having millimetre and/or micrometre and/or nanometre structures on at least the first surface, wherein the structures are produced by an imprinting process;
- applying at least one mechanical stabilizer to the structures on the first surface, wherein the at least one mechanical stabilizer provides mechanical protection from loads and can be dissolved in a solvent, wherein the at least one mechanical stabilizer is applied by at least one of centrifugal coating, spray coating or immersion;
- fixing the first surface having the at least one mechanical stabilizer applied thereto to a sample holder, wherein fixing includes directly fixing one of the at least one mechanical stabilizer to the sample holder, and using at least one of a vacuum fixing, an electrostatic fixing or a magnetic fixing to directly fix a portion of the one of the at least one mechanical stabilizer applied by centrifugal coating, spray coating or immersion to the sample holder;
- and
- processing the second surface while the first surface is fixed to the sample holder.
2 more elements
A method for processing a substrate, said method comprising:
- a) delivering a substrate by use of a delivery unit, the substrate having first and second surface;
- b) applying and/or arranging, millimetre and/or micrometre and/or nanometre structures on at least the first surface of the substrate, wherein the structures are produced by an imprinting process;
- c) applying at least one mechanical stabilizer to the structures on the first surface, wherein the at least one mechanical stabilizer provides mechanical protection from loads and can be dissolved in a solvent, wherein the at least one mechanical stabilizer is applied by at least one of centrifugal coating, spray coating or immersion;
- d) fixing the first surface having the at least one mechanical stabilizer applied thereto to a sample holder, wherein fixing includes directly fixing one of the at least one mechanical stabilizer to the sample holder, using at least one of a vacuum fixing, an electrostatic fixing or a magnetic fixing to directly fix a portion of the one of the at least one mechanical stabilizer applied by centrifugal coating, spray coating or immersion to the sample holder;
- e) processing the second surface while the first surface is fixed to the sample holder;
- and
- f) receiving the substrate at a storage unit.
4 more elements
Dependencies are inferred from the claim text.