Vacuum distillation apparatus and methods
OwnerPaul Simon, Craig Marion +1inventors
InventorsPaul Simon, Craig Marion, Tina Asher Marion
Life of this patent
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Abstract
Vacuum distillation apparatus and methods are provided. In an embodiment, an apparatus is provided that includes an evaporation chamber having a bottom flow rate control (FRC) surface that is curved to provide multiple flow rates to a solution as it flows across the bottom surface. The apparatus also includes a wiper that is curved to match the curve of the bottom FRC surface and wipes the bottom FRC surface to distribute the solution. A heater heats the bottom FRC surface to evaporate one or more components from the moving solution.
Claims17
An apparatus, comprising:
- an evaporation chamber having a bottom flow rate control (FRC) surface that is curved to provide multiple flow rates to a solution as it flows across the bottom surface;
- a wiper that wipes the bottom FRC surface to distribute the solution, wherein the wiper is curved to match the curve of the bottom FRC surface;
- and
- a heater that heats the bottom FRC surface to evaporate the solution to produce a vapor, wherein the evaporation chamber further comprises:
- a top flow rate control (FRC) surface that is curved to provide multiple flow rates to the solution as it flows across the top surface;
- and
- a second wiper that wipes the top FRC surface to distribute the solution to an outer edge of the top surface, and wherein the second wiper is curved to match the curve of the top FRC surface.
An apparatus comprising:
- an evaporation chamber having a bottom flow rate control (FRC) surface that is curved to provide multiple flow rates to a solution as it flows across the bottom surface;
- a wiper that wipes the bottom FRC surface to distribute the solution, wherein the wiper is curved to match the curve of the bottom FRC surface;
- and
- a heater that heats the bottom FRC surface to evaporate the solution to produce a vapor, wherein the evaporation chamber further comprises a top surface that is selectively spaced above the bottom FRC surface, and wherein the top surface is shaped so that at least a portion of the vapor condenses on the top surface and flows along the shape of the top surface to a collection location.
A method for operating an evaporation chamber having a top flow rate control (FRC) surface that is curved to provide multiple flow rates to a solution, and a wiper that is curved to match the curve of the top FRC surface and that wipes the top FRC surface to distribute the solution, the method comprising:
- heating the top FRC surface;
- adding the solution to the chamber so that the solution flows across the top FRC surface at the multiple flow rates, is distributed by the wiper, and at least a portion of the solution evaporates to form a vapor;
- collecting the vapor;
- and
- circulating remaining solution back into the chamber.
Dependencies are inferred from the claim text.