Imprint apparatus and article manufacturing method
AssigneeCanon Kabushiki Kaisha
InventorTakashi Hosaka
Life of this patent
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Abstract
An imprint apparatus forms a pattern on a substrate by bringing a pattern region of a mold into contact with imprint material on the substrate and curing the imprint material. The mold has first and second surfaces. The first surface includes the pattern region and a peripheral region surrounding the pattern region. The second surface includes a held region. The imprint apparatus includes a mold driving mechanism to hold the held region of the mold and drive the mold, a mold conveyance mechanism to hold the peripheral region of the mold and convey the mold, and a controller to control the mold conveyance mechanism based on thickness between the peripheral region and the held region.
Claims19
An imprint apparatus that forms a pattern on a substrate by bringing a pattern region of a mold into contact with an imprint material on the substrate and curing the imprint material,
- wherein the mold has a first surface and a second surface on sides opposite to each other, the first surface including the pattern region and a peripheral region which surrounds the pattern region, the second surface including a held region, and
- the imprint apparatus comprises
- a mold driving mechanism configured to hold the held region of the mold and drive the mold,
- a mold conveyance mechanism configured to hold the peripheral region of the mold and convey the mold, and
- a controller configured to control, when handover of the mold is to be performed between the mold driving mechanism and the mold conveyance mechanism, the mold conveyance mechanism based on thickness information which indicates a distance between the peripheral region and the held region.
A pattern forming apparatus that forms a pattern on a substrate by using an original,
- wherein the original has a first surface and a second surface on sides opposite to each other, the first surface including a pattern region which includes a pattern to be transferred onto the substrate and a peripheral region which surrounds the pattern region, the second surface including a held region, and
- the pattern forming apparatus comprises
- an original driving mechanism configured to hold the held region of the original and drive the original,
- an original conveyance mechanism configured to hold the peripheral region of the original and convey the original, and
- a controller configured to control, when handover of the original is to be performed between the original driving mechanism and the original conveyance mechanism, the original conveyance mechanism based on thickness information which indicates a distance between the peripheral region and the held region.
Dependencies are inferred from the claim text.