Image sensor and method for fabricating the image sensor
AssigneeTaiwan Semiconductor Manufacturing Company, Ltd.
InventorsYun-Wei Cheng, Chun-Hao Chou, Kuo-Cheng Lee, Hsin-Chi Chen
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AssigneeTaiwan Semiconductor Manufacturing Company, Ltd.
InventorsYun-Wei Cheng, Chun-Hao Chou, Kuo-Cheng Lee, Hsin-Chi Chen
Estimating the term…
An image sensor and a method for fabricating the image sensor are provided. In the method for fabricating the image sensor, at first, a substrate having a first surface and a second surface opposite to the first surface is provided. Then, light-sensitive regions are formed in the substrate. Thereafter, transfer gate structures are formed on the first surface of the substrate. Then, the first surface of the substrate is formed to form recess structures on the light-sensitive regions. Thereafter, light-reflective layers are formed to cover the recess structures of the first surface of the substrate, in which the recess structures are filled with protrusion structures of the light-reflective layers. Further, the second surface of the substrate may be etched to form recess structures corresponding to the light-sensitive regions.
An image sensor, comprising:
An image sensor, comprising:
An image sensor, comprising:
Dependencies are inferred from the claim text.