Apparatus and methods for isolating a reaction chamber from a loading chamber resulting in reduced contamination

A semiconductor processing apparatus comprising:

• a reaction chamber comprising a baseplate including an opening;
• a moveable substrate support configured to support a substrate and
• configured to move towards the opening of the baseplate, and between a loading position and a processing position;
• a metal annular sealing ring extending around the substrate support and configured to form a seal between the baseplate and the substrate support when the substrate support is in the processing position, wherein a plurality of apertures extend through the sealing ring, the apertures configured to provide a flow path between a position below the sealing ring to a position above the sealing ring;
• and
• wherein the baseplate comprises a surface, the surface including an apex, the seal formed between the apex and the metal sealing ring, wherein the apertures extend radially across the apex.

A semiconductor processing apparatus comprising:

• a reaction chamber comprising a baseplate including an opening;
• a moveable substrate support comprising a recess configured to support a substrate the substrate support
• configured to move towards the opening of the baseplate;
• and
• an annular sealing ring configured to form a seal between the baseplate and the substrate support, the seal positioned radially from a center of the substrate support at a distance at least 30% or greater than the distance between the center of the substrate support and an outer edge of the recess, wherein a plurality of apertures extend through the sealing ring, the apertures configured to provide a flow path between a position below the sealing ring to a position above the sealing ring, wherein the baseplate comprises a surface, the surface including an apex, the seal formed between the apex and the sealing ring, wherein the apertures extend radially across the apex.