Plasma processing apparatus and plasma processing method

A plasma processing apparatus comprising:

• a processing chamber in which a sample is subjected to plasma processing;
• a radio frequency power supply supplying radio frequency power that generates plasma;
• a sample stage on which the sample is placed;
• an ultraviolet light source applying an ultraviolet ray;
• and
• a controller configured to control the radio frequency power supply and the ultraviolet light source such that the radio frequency power is supplied into the processing chamber and a pulse-modulated ultraviolet ray is applied into the processing chamber,
• wherein the sample stage includes an electrode to which a direct current voltage is applied, the sample being electrostatically chucked by the direct current voltage, and
• wherein the controller is configured to control the ultraviolet light source each that before the direct current voltage is applied to the electrode, the pulse-modulated ultraviolet ray is applied into the process chamber.