Sample holding mechanism, manufacturing method for same, and charged particle beam device

A charged particle beam device comprising:

• an electron source;
• a sample holding mechanism that includes a window with a support film that supports a sample being disposed, a hole that has a linear-shaped edge and through which a reference wave is transmitted, and a layer that is thicker than the support film that is disposed on an edge of the window and in which a plurality of the windows and a plurality of the holes are arrayed;
• a mechanical movement mechanism that performs movement of the sample holding mechanism;
• an image shift deflection optical system that performs parallel shifting of an image along a linear-shaped side of the hole in the sample holding mechanism;
• a detector that detects an electron beam that is emitted from the electron source and is transmitted through the sample holding mechanism;
• and
• a control unit that performs visual field selection by controlling the image shift deflection optical system and the mechanical movement mechanism and controls to continuously acquire images from an array of the windows and the holes on the basis of an output from the detector.