Charged particle beam device

A charged particle beam device comprising:

• a charged particle gun;
• a sample stage which is provided with a measurement sample to be irradiated with a charged particle beam including a charged particle emitted from the charged particle gun;
• an electric field-correcting electrode which is arranged in a periphery of the sample stage and corrects an electric field in a vicinity of an outer peripheral portion of the measurement sample;
• a charged particle beam optical system for the charged particle beam which includes an objective lens;
• a processor which controls each component;
• and
• a display which is connected to the processor, wherein
• the display displays a time change of a voltage having periodicity or a time change of an absolute value of a voltage which is equal to or more than an absolute value of a voltage to be applied when the measurement sample is measured, and to be applied to the electric field-correcting electrode when the foreign matter adhering to the electric field-correcting electrode is removed.

A charged particle beam device comprising:

• a charged particle gun;
• a sample stage which is provided with a measurement sample to be irradiated with a charged particle beam including a charged particle emitted from the charged particle gun;
• an electric field-correcting electrode which is arranged in a periphery of the sample stage;
• a charged particle beam optical system for the charged particle beam which includes an objective lens;
• a processor which controls each component;
• and
• a display which is connected to the processor, wherein
• the display displays a time change of a voltage having periodicity or a time change of an absolute value of a voltage which is equal to or more than an absolute value of a voltage to be applied when the measurement sample is measured, and to be applied to an electrode in the vicinity of the electric field-correcting electrode when the foreign matter adhering to the electric field-correcting electrode is removed.