Sewing analysis system and program

A sewing analysis system for performing a simulation of a sewing process based on a flat paper pattern outer shape, comprising:

• a display;
• memory storing computer-readable instructions;
• and
• one or more processors configured to execute the computer-readable instructions such that the one or more processors are configured to perform operations including,
• receiving design data of an object to be covered by a material and paper pattern outer shape data corresponding to the design data;
• providing an instruction on an alignment position of first cloth and second cloth, seam allowance widths, and a stitching pitch based on the paper pattern outer shape data;
• creating and displaying a cloth mesh on each of the first cloth and the second cloth based on the paper pattern outer shape data;
• creating and displaying a temporary stitching line on each of the first cloth and the second cloth based on the paper pattern outer shape data and the seam allowance widths;
• creating a beam element forming a stitching line on the temporary stitching line based on the stitching pitch;
• connecting the beam element of the first cloth and the beam element of the second cloth by spring elements shown on the display;
• connecting the beam elements and the cloth meshes;
• and
• folding and displaying seam allowances by applying loads in opposite directions respectively to the stitching lines and to peripheral edges on sides of the stitching lines of the first cloth and the second cloth.