Exposure apparatus, method for controlling the same and article manufacturing method

An exposure apparatus operable to expose a substrate, the apparatus comprising:

• a projection optical system configured to project a pattern of a mask onto the substrate;
• a substrate stage configured to hold and move the substrate;
• and
• a controller configured to control exposure of the substrate held by the substrate stage,
• wherein the controller is configured to:
• obtain telecentricity information, which is information on telecentricity for respective image heights of the projection optical system, and obtain height information, which is information on a height of a pattern formed on the substrate in advance,
• determine a defocus amount from a difference between a best focus position in an optical axis direction of the projection optical system and the height of the pattern formed on the substrate in advance indicated by the obtained height information,
• determine an amount of deviation of an image of the pattern projected onto the substrate with respect to the pattern of the mask based on the determined defocus amount and the telecentricity for respective image heights, and
• correct, during the exposure of the substrate, the deviation of the image for each shot region based on the determined amount of deviation.