Optical system for a projection exposure apparatus

An optical system, comprising:

• a polarization-influencing arrangement comprising first and second double reflection surface units,
• wherein:
• the first double reflection surface unit comprises first and second reflection surfaces which reflect light at a wavelength;
• the second double reflection surface unit comprises first and second reflection surfaces which reflect light at the wavelength;
• within each of the first and second double reflection surface units, the first and second reflection surfaces are directly adjacent at a distance d1 and at an angle of 0°±10° relative to one another;
• the first reflection surface of the first double reflection surface unit and the second reflection surface of the second double reflection surface unit are directly adjacent at a distance d2 and at an angle of 0°±10° relative to one another;
• during operation of the optical system, light at the wavelength incident on the first reflection surfaces defines an angle of 43°±10° with the first reflection surface;
• and
• during operation of the optical system, light at the wavelength incident on the first reflection surface of the first double reflection surface unit is reflected toward the second reflection surface of the second double reflection surface unit;
• the first double reflection surface unit does not transmit light at the wavelength;
• the second double reflection surface unit does not transmit light at the wavelength;
• and
• d2>5*d1.