Metrology robustness based on through-wavelength similarity
AssigneeASML Netherlands B.V.
InventorsMiguel Garcia Granda, Christian Marinus Leewis, Frank Staals
Life of this patent
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AssigneeASML Netherlands B.V.
InventorsMiguel Garcia Granda, Christian Marinus Leewis, Frank Staals
Estimating the term…
A method including obtaining a measurement result from a target on a substrate, by using a substrate measurement recipe; determining, by a hardware computer system, a parameter from the measurement result, wherein the parameter characterizes dependence of the measurement result on an optical path length of the target for incident radiation used in the substrate measurement recipe and the determining the parameter includes determining dependence of the measurement result on a relative change of wavelength of the incident radiation; and if the parameter is not within a specified range, adjusting the substrate measurement recipe.
A computer program product comprising a non-transitory computer readable medium having instructions therein, the instructions, upon execution by a computer system, configured to cause the computer system to at least:
A computer program product comprising a non-transitory computer readable medium having instructions therein, the instructions, upon execution by a computer system, configured to cause the computer system to at least:
A method comprising:
Dependencies are inferred from the claim text.