Array substrate and manufacturing method thereof, and display device

A manufacturing method of an array substrate, comprising:

• forming a reflection region film on a base substrate, the base substrate comprising a pixel region, the pixel region comprising a reflection region, the reflection region film being formed in the reflection region;
• roughening a surface of the reflection region film facing away from the base substrate to form a reflection region layered structure, the reflection region layered structure comprising a particle layer;
• and
• forming a reflection electrode on the particle layer,
• wherein the reflection region layered structure further comprises a base portion, and the particle layer is on a side of the base portion facing away from the base substrate and is in contact with the base portion, and
• wherein a material of the base portion comprises a conductive material or a semiconductor material.

A manufacturing method of an array substrate, comprising:

• forming a reflection region film on a base substrate, the base substrate comprising a pixel region, the pixel region comprising a reflection region, the reflection region film being formed in the reflection region;
• roughening a surface of the reflection region film facing away from the base substrate to form a particle layer;
• and
• forming a reflection electrode on the particle layer, wherein the manufacturing method further comprises:
• forming a thin film transistor, wherein the thin film transistor comprises a semiconductor active layer and a source-drain electrode layer, the reflection region film and the semiconductor active layer are formed of a same film by a same patterning process, the reflection electrode and the source-drain electrode layer are formed of a same film by a same patterning process.