Apparatus and method for prevention of contamination on collector of extreme ultraviolet light source

A method of preventing contamination of a collector of an extreme ultraviolet (EUV) radiation source, the method comprising:

• providing an EUV collector mirror body on which a reflective layer as a reflective surface is disposed;
• and
• providing a trajectory correcting device attached to or embedded in the EUV collector mirror body;
• and
• applying an electric field to an EUV collector mirror body to adjust a trajectory of metal debris towards an opposite side of the EUV radiation source away from the EUV collector mirror body,
• wherein the trajectory correcting device includes a pulse timing module coupled to a first charging point at a lower cone of an EUV vessel, the lower cone being opposite from the collector and adjacent to exhaust ports.

An extreme ultraviolet (EUV) radiation source, comprising:

• a chamber enclosing an EUV vessel,
• the EUV vessel comprising:
• a collector mirror configured to reflect EUV radiation;
• a debris collection mechanism disposed over the collector mirror;
• a lower cone disposed over the debris collection mechanism;
• at least one first charging point attached to the collector mirror;
• a second charging point attached to the lower cone;
• and
• a pulse timing module and a DC bias circuit coupled to the first charging point and the second charging point.