Solid-state imaging device, production method, and electronic apparatus
AssigneeSony Corporation
InventorHikaru Iwata
Life of this patent
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AssigneeSony Corporation
InventorHikaru Iwata
Estimating the term…
The present technology relates to a solid-state imaging device, a production method, and an electronic apparatus that can prevent sensitivity unevenness from generating. The solid-state imaging device includes a pixel array unit having a plurality of pixels, a microlens formed by laminating a plurality of lens layers for the every pixel, and a film formed between the lens layers with a uniform film thickness having a refractive index lower than a refractive index of the lens layer. The present technology is applicable to an amplification type solid-state imaging device such as a surface irradiation type or rear irradiation type CMOS image sensor, and a charge transfer type solid-state imaging device such as a CCD image sensor.
A solid-state imaging device imaging device, comprising:
A method of producing a solid-state imaging device including a pixel array having a plurality of pixels, comprising:
An electronic apparatus, comprising:
Dependencies are inferred from the claim text.