MEMS deposition trap for vacuum transducer protection
AssigneeMicrogauge AG
InventorNina Wojtas
Life of this patent
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Abstract
The present invention relates to a MEMS deposition trap (10) comprising: a manifold layer having manifold inlet channels and manifold outlet channels, a microchannel layer (20) having microchannels (33), wherein the manifold layer and the microchannel layer are bonded together so as to form a fluid path, wherein a fluid is forced to pass through the microchannels (33) when flowing from the manifold inlet channels to the manifold outlet channels. Furthermore, it relates to a vacuum sensor having such a deposition trap as and to a process chamber of a manufacturing equipment, preferably used for thin-film deposition or etching processes, comprising such a vacuum sensor.
Claims13
A deposition trap, comprising:
- a manifold comprising:
- a first layer having manifold inlet channels and manifold outlet channels;
- and
- a second layer having channels connecting the manifold inlet channels to the manifold outlet channels,
- wherein the first layer and the second layer are bonded together so as to form fluid paths between the manifold inlet channels and the manifold outlet channels,
- wherein the fluid paths are configured such that a fluid is forced to pass through the channels of the second layer when flowing from the manifold inlet channels to the manifold outlet channels,
- wherein a first manifold inlet channel is formed by two inlet side walls and an inlet end wall connecting the inlet side walls,
- wherein the inlet side walls are arranged to form an opening at an inlet side of the deposition trap.
Dependencies are inferred from the claim text.