Optical emission spectroscopy calibration device and system including the same

An OES calibration system comprising:

• a chamber including a viewport, and in which a semiconductor process using plasma is performed;
• an adapter fastened to the viewport, and including a first beam splitter and a second beam splitter splitting incident light;
• an OES device connected to the viewport through the adapter, and detecting an optical spectrum of the plasma to generate OES data;
• and
• an OES calibration device detachably fastened to the adapter, and including a light source emitting inspection light, and a spectrometer detecting the inspection light split by the first beam splitter and the second beam splitter,
• wherein the first beam splitter splits the inspection light into first light in the viewport direction and second light in the OES calibration device direction, and
• the second beam splitter splits the inspection light into third light in the OES device direction and fourth light in the OES calibration device direction.

An OES calibration device comprising:

• at least one light source;
• and
• at least one shutter connected to an adapter fastened to a viewport of each of a plurality of plasma chambers through an optical cable, the at least one shutter controlling each of a plurality of inspection lights generated from the at least one light source to be transmitted to the adapter of each of the plurality of plasma chambers,
• wherein the adapter comprises a first beam splitter and a second beam splitter fastened to a mount provided on an outer surface of the adapter and inserted into the adapter, and the first beam splitter and the second beam splitter split the incident light, and
• the OES calibration device detects an optical spectrum of the plurality of inspection lights that are split, and corrects OES data of each of the plurality of plasma chambers using the detected optical spectrum.