Gas supply member and gas processing apparatus

A gas processing apparatus that performs processing, in a vertical reaction vessel in which a vacuum atmosphere is formed, by heating a plurality of substrates held in a shelf shape on a substrate holder and supplying a processing gas to the substrates, comprising:

• a gas supply member including a straight flow path having a straight-line shape along a vertical direction and a first end to be supplied with the processing gas, a gas discharge port branched from the straight flow path and having an opening facing a horizontal direction, a processing gas circulation path extending along an extension line of the straight flow path, connected to a second end of the straight flow path and configured to collect foreign substances contained in the processing gas supplied to the straight flow path, and a foreign substance accommodation region arranged to face the processing gas circulation path, wherein the foreign substance accommodation region is configured by a portion of the processing gas circulation path that extends in a direction outward of the processing gas circulation path when viewed in a direction orthogonal to a circulation direction of the processing gas,
• wherein a distal end of the portion is closed so that the foreign substances are accommodated at the distal end,
• wherein a wall portion forming the straight flow path has a wave shape, and
• wherein a space is formed in the straight flow path from a downstream of the gas discharge port to an entrance of the processing gas circulation path without being shielded in a direction of the straight flow path.

A gas processing apparatus that performs processing, in a reaction vessel in which a vacuum atmosphere is formed, by supplying a processing gas to a substrate mounted on one surface side of a rotary table and heating the substrate, comprising:

• a gas supply member including a straight flow path having a straight-line shape to extend in a direction intersecting with a rotation direction of the rotary table on one side of the rotary table and a first end to be supplied with the processing gas from, a gas discharge port branched from the straight flow path and having an opening facing the one side of the rotary table, a processing gas circulation path extending along an extension line of the straight flow path, connected to a second end of the straight flow path, and configured to collect foreign substances contained in the processing gas supplied to the straight flow path, and a foreign substance accommodation region arranged to face the processing gas circulation path,
• wherein the foreign substance accommodation region is configured by a portion of the processing gas circulation path that extends in a direction outward of the processing gas circulation path when viewed in a direction orthogonal to a circulation direction of the processing gas,
• wherein a distal end of the portion is closed so that the foreign substances are accommodated at the distal end,
• wherein a wall portion forming the straight flow path has a wave shape, and
• wherein a space is formed in the straight flow path from a downstream of the gas discharge port to an entrance of the processing gas circulation path without being shielded in a direction of the straight flow path.