Method of manufacturing antireflection film

Abstract

Provided is a method of manufacturing an antireflection film including, in order: a step (1) of providing a layer (a) containing a curable compound (a1) and a particle (a2) having an average primary particle diameter of 100 nm to 380 nm and a layer (b) containing a compound (b1) incompatible with the curable compound (a1) so that the particle (a2) is buried in a layer defined by combining the layer (a) and the layer (b), on a substrate; a step (2) of curing the layer (a) in a state in which the particle (a2) is buried in the layer defined by combining the layer (a) and the layer (b); and a step (3) of removing the layer (b) to form an uneven shape on a surface of the layer (a) with the particle (a2).

Dependencies are inferred from the claim text.