US 10,870,183 B2 · Substrate processing apparatus

Abstract

Provided is a substrate processing apparatus that includes: a rotary joint including a rotary unit that rotates together with the rotation of the head unit, a fixing unit that is provided around the rotary unit, and a sealing unit that seals a gap between the rotary unit and the fixing unit; and an outlet pipe through which the quenching water is discharged. A first flow passage through which a gas passes and a second flow passage through which the quenching water passes are formed in the rotary joint, and the second flow passage is isolated from the first flow passage by the sealing unit. One end of the outlet pipe communicates with an outlet port of the second flow passage of the rotary joint, and the other end of the outlet pipe is opened to atmosphere at a position lower than the outlet port of the second flow passage.

Claims15

Dependent claims

A substrate processing apparatus comprising:

a rotary joint including a rotor configured to rotate together with the rotation of a top ring, a stator radially surrounding the rotor, a first seal configured to seal a gap between the rotor and the stator, a first flow passage embedded within rotor and configured to allow a gas to pass therethrough, and a second flow passage passing through the stator and configured to allow quenching water to pass therethrough, the second flow passage being isolated from the first flow passage by the first seal;
and
an outlet pipe configured to discharge the quenching water, and having a first end configured to communicate with an outlet port of the second flow passage of the rotary joint at one end and a second end opened to atmosphere at a position lower than the outlet port of the second flow passage.

Dependencies are inferred from the claim text.

Substrate processing apparatus

Life of this patent

Substrate processing apparatus

Life of this patent

Abstract

Claims15