Manufacturing a collimator element

A collimator element, manufactured by at least:

• applying a lithographic coating layer;
• exposing the lithographic coating layer in exposure regions corresponding to a structure of the collimator element, the structure of the collimator element being aligned on a common focus;
• developing the lithographic coating layer to provide a pre-structure of the collimator element;
• applying an X-ray absorbing layer via cathode sputtering;
• and
• removing at least the X-ray absorbing layer from regions of the pre-structure, wherein during a repetition of the applying of the lithographic coating layer, exposing, developing, applying the X-ray absorbing layer, and removing, exposure regions offset from at least one previous exposure region are exposed, resulting in formation of a stepped structure of the collimator element, aligned on a common focus.

A method for manufacturing a scattered-radiation collimator, comprising:

• providing a number of collimator elements, each of the collimator elements being manufactured by at least
• applying a lithographic coating layer,
• exposing the lithographic coating layer in exposure regions corresponding to a structure of the collimator element, the structure of the collimator element being aligned on a common focus,
• developing the lithographic coating layer to provide a pre-structure of the collimator element;
• applying an X-ray absorbing layer via cathode sputtering, and
• removing at least the X-ray absorbing layer from regions of the pre-structure, wherein during a repetition of the applying of the lithographic coating layer, exposing, developing, applying the X-ray absorbing layer, and removing, exposure regions offset from at least one previous exposure region are exposed, resulting in formation of a stepped structure of the collimator element, aligned on a common focus;
• and
• joining the number of collimator elements together, to form the scattered-radiation collimator.

A scattered-radiation collimator, manufactured by at least:

• providing a number of collimator elements, each of the collimator elements being manufactured by at least
• applying a lithographic coating layer,
• exposing the lithographic coating layer in exposure regions corresponding to a structure of the collimator element, the structure of the collimator element being aligned on a common focus,
• developing the lithographic coating layer to provide a pre-structure of the collimator element;
• applying an X-ray absorbing layer via cathode sputtering, and
• removing at least the X-ray absorbing layer from regions of the pre-structure, wherein during a repetition of the applying of the lithographic coating layer, exposing, developing, applying the X-ray absorbing layer, and removing, exposure regions offset from at least one previous exposure region are exposed, resulting in formation of a stepped structure of the collimator element, aligned on a common focus;
• and
• joining the number of collimator elements together, to form the scattered-radiation collimator.