Condensation suppressing method and processing apparatus
AssigneeTokyo Electron Limited
InventorsShin Matsuura, Takuya Nishijima
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AssigneeTokyo Electron Limited
InventorsShin Matsuura, Takuya Nishijima
Estimating the term…
A processing apparatus includes a first temperature measuring unit configured to measure a surface temperature of a first member exposed in a first closed space, a supply line configured to supply a low-dew point gas into the first closed space and a control unit configured to control a flow rate of the low-dew point gas. The control unit performs a first process to a third process. In the first process, an absolute humidity of a gas within the first closed space at a position of a surface of the first member is specified for the flow rate of the low-dew point gas. In the second process, a saturated absolute humidity at the surface temperature of the first member is specified. In the third process, the flow rate of the low-dew point gas is controlled based on the absolute humidity of the gas and the saturated absolute humidity.
A condensation suppressing method in a processing apparatus configured to process a processing target object,
A processing apparatus configured to process a processing target object, comprising:
Dependencies are inferred from the claim text.