Mechanism for creating vacuum in processing apparatus
AssigneeTaiwan Semiconductor Manufacturing Company, Ltd.
InventorsYung-Syuan Lan, Chia-Wei Chen
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AssigneeTaiwan Semiconductor Manufacturing Company, Ltd.
InventorsYung-Syuan Lan, Chia-Wei Chen
Estimating the term…
A processing apparatus is provided. The processing apparatus includes a processing chamber having a gas outlet. The processing apparatus further includes a pump. The pump communicates with the gas outlet and is configured to exhaust gas from the processing chamber via the gas outlet. The processing apparatus also includes an intersecting module. The intersecting module includes a number of support members and a number of internal ventilating plates. The support members are arranged along a longitudinal direction, and each of the internal ventilating plates has a number of orifices. At least one of the internal ventilating plates is positioned between two of the support members positioned adjacent to each other.
A processing apparatus, comprising:
An intersecting module, comprising:
An intersecting module, comprising:
Dependencies are inferred from the claim text.