Method and system for the localized deposit of metal on a surface
AssigneeIllinois Tool Works Inc.
InventorZhigang Xiao
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AssigneeIllinois Tool Works Inc.
InventorZhigang Xiao
Estimating the term…
The present disclosure is directed to a method and system for the localized deposition of a metal layer on a surface. The method involves introducing at least two gaseous reactants to a substrate surface that is locally heated by a laser. The surface is heated to a temperature at which the gaseous reactants undergo a reaction that results in metal crystal growth on the substrate surface. The reaction is maintained for a desired period of time and under desired conditions to produce a localized deposit of a metal layer on the heated zone of the substrate. In some embodiments, the gas outlets and the laser may be moved in a controlled manner so that a metal layer may be deposited in a desired pattern on the substrate surface.
A method for the localized deposition of a metal layer comprising:
A method for the localized deposition of a metal layer comprising:
Dependencies are inferred from the claim text.