Rinse agent composition for silicon wafers
AssigneeKao Corporation
InventorYohei Uchida
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Abstract
The rinsing composition for a silicon wafer of the present invention contains: a water-soluble polymer A containing a constitutional unit A having a betaine structure; and an aqueous medium. The water-soluble polymer A preferably contains a constitutional unit expressed by Formula (1) below. The water-soluble polymer preferably further contains a constitutional unit B expressed by Formula (2) below. The weight average molecular weight of the water-soluble polymer A is preferably 1,000 or more and preferably 3,000,000 or less. The rinsing composition for a silicon wafer of the present invention contains a pH regulator as needed.
Claims6
A rinsing composition for a silicon wafer, comprising:
- a water-soluble polymer A containing a constitutional unit A having a betaine structure;
- and
- an aqueous medium.
Dependencies are inferred from the claim text.