Apparatus and method for producing alkaline water for cleaning electronic device
AssigneeNomura Micro Science Co., Ltd.
InventorTakayuki Jizaimaru
Life of this patent
Estimating the term…
Abstract
To provide method and apparatus for producing alkaline water, capable of preventing mixture of fine particles derived from a gas dissolving membrane device into hydrogen water. An apparatus for producing alkaline water for cleaning electronic device includes: a pH adjusting device 11 configured to adjust ultrapure water to be alkaline; a deaeration device 13 configured to deaerate the ultrapure water adjusted to be alkaline; and a gas dissolving membrane device 14 having a gas permeable membrane to dissolve functional gas into the deaerated ultrapure water.
Claims10
An apparatus for producing alkaline water for cleaning electronic device, the apparatus comprising:
- a pH adjusting device to add a pH regulator into ultrapure water to keep the ultrapure water alkaline;
- a feed water pump to feed the ultrapure water kept alkaline at a discharge pressure 0.2 MPa to 0.4 MPa;
- a deaerator to deaerate the ultrapure water fed from the feed water pump;
- and
- a gas dissolver having a gas permeable membrane to dissolve functional gas into the deaerated ultrapure water.
A method for producing alkaline water for cleaning electronic device, the method comprising:
- adjusting a pH of ultrapure water to keep the ultrapure water alkaline;
- feeding the alkaline ultrapure water at a discharge pressure 0.2 MPa to 0.4 MPa by a feed water pump;
- deaerating the alkaline ultrapure water fed by the feed water pump;
- and
- dissolving functional gas into the deaerated alkaline ultrapure water.
Dependencies are inferred from the claim text.