Annular unit for moisture management in respiratory mask
AssigneeHoneywell International Inc.
InventorsAnna Liu, Linan Zhao, Kevin Lu
Life of this patent
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AssigneeHoneywell International Inc.
InventorsAnna Liu, Linan Zhao, Kevin Lu
Estimating the term…
Embodiments relate generally to absorbing elements in respiratory face masks. Applicants have developed a structure for respiratory masks that can both absorb moisture from the face (such as perspiration, as well as from condensed moisture in the breath), and maintain a low breath resistance (won't increase the breath resistance significantly). The structure may comprise an annular structure added to the respiratory masks for moisture management, wherein the annular structure comprises moisture absorbent materials. This structure may also be known as an absorbing element operable to absorb moisture effectively, provide a respiratory mask with improved moisture control characteristics, reduce fogging of a face shield or eyeglasses of the wearer, and reduce the amount of uncomfortable moisture buildup on the face of the wearer.
A face mask comprising:
A method of manufacturing a face mask comprising an absorbing element, the method comprising:
A face mask comprising:
Dependencies are inferred from the claim text.