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US 10,864,096 B2Granted
Three-dimensional thin-film nitinol devices
AssigneeMonarch Biosciences, Inc.
InventorsAlfred David Johnson, Colin Kealey
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Abstract
A method of manufacturing three-dimensional thin-film nitinol (NiTi) devices includes: depositing multiple layers of nitinol and sacrificial material on a substrate. A three-dimensional thin-film nitinol device may include a first layer of nitinol and a second layer of nitinol bonded to the first layer at an area masked and not covered by the sacrificial material during deposition of the second layer.
Claims7
A method comprising:
- deep reactive ion etching a pattern of grooves on a surface of a semiconductor substrate, the grooves corresponding to fenestrations in a desired three-dimensional nitinol structure;
- depositing a lift-off layer on the grooved semiconductor substrate surface;
- depositing a first NiTi layer over the lift-off layer;
- depositing a sacrificial layer through a shadow mask to partially cover the first NiTi layer, the sacrificial layer corresponding to a lumen in the desired three-dimensional nitinol structure;
- sputter depositing an aluminum bonding layer onto the first NiTi layer through a reverse mask prior to deposition of a second NiTi layer, the reverse mask being approximately a reverse image of the shadow mask;
- and
- depositing the second NiTi layer over the sacrificial layer and the aluminum bonding layer.
4 more elements
Dependencies are inferred from the claim text.