Method of designing layout of photomask and method of manufacturing photomask
AssigneeSamsung Electronics Co., Ltd.
InventorsYong-Seok Jung, Sung-Hoon Park, Jong-Su Kim, Suk-Jong Bae
Life of this patent
Estimating the term…
Abstract
A method of designing a layout of a photomask and a method of manufacturing a photomask, the method of designing a layout of a photomask including obtaining a design layout of a mask pattern; performing an optical proximity correction on the design layout to obtain design data; obtaining data of a position error of a pattern occurring during an exposure of the photomask according to the design data; correcting position data of the pattern based on the position error data to correct the design data; and providing the corrected position data to an exposure device to expose an exposure beam according to the corrected design data.
Claims9
A method of designing a layout of a photomask, the method comprising:
- obtaining a design layout of a mask pattern;
- performing an optical proximity correction on the design layout to obtain design data;
- obtaining data of a position error of a pattern occurring during an exposure of the photomask according to the design data;
- correcting position data of the pattern based on the position error data to correct the design data;
- and
- providing the corrected position data to an exposure device to expose an exposure beam according to the corrected design data,
- wherein obtaining the data of the position error of the pattern includes obtaining a position error element caused by the exposure device and a position error element caused by a pattern density.
Dependencies are inferred from the claim text.