Memory arrays, and methods of forming memory arrays
AssigneeMicron Technology, Inc.
InventorsChanghan Kim, Gianpietro Carnevale
Life of this patent
Estimating the term…
Abstract
Some embodiments include a memory array having a vertical stack of alternating insulative levels and wordline levels. Channel material extends along the stack. Conductive segments are along the wordline levels. Each of the conductive segments has, along a cross-section, first and second ends in opposing relation to one another. The conductive segments include gates and wordlines adjacent the gates. The wordlines encompass the second ends, and the gates have rounded (e.g., substantially parabolic) noses which encompass the first ends. Some embodiments include methods of forming integrated assemblies.
Claims10
A memory array, comprising:
- a vertical stack of alternating insulative levels and wordline levels;
- channel material extending vertically along the stack;
- conductive segments along the wordline levels;
- individual of the conductive segments having, along a cross-section, first and second ends in opposing relation to one another;
- the conductive segments comprising gates and wordlines adjacent the gates;
- the wordlines encompassing the second ends;
- the gates having substantially parabolic noses encompassing the first ends, the substantially parabolic noses extending outwardly toward the channel material;
- and
- memory cell structures along the wordline levels and located between the channel material and the parabolic noses of the gates;
- the memory cell structures including charge-storage regions and charge-blocking regions;
- the charge-blocking regions being between the charge-storage regions and the gates.
Dependencies are inferred from the claim text.