Back to results
US 10,770,338 B2Granted
System comprising a single wafer, reduced volume process chamber
AssigneeGlobalfoundries Inc.
InventorsWieland Pethe, Dirk Noack
Life of this patent
Estimating the term…
Abstract
One illustrative system disclosed herein includes a process chamber positioned within a processing tool and a wafer chuck that is adapted to be positioned at a wafer processing position located within the process chamber and at a chuck wafer transfer position located outside of the process chamber.
Claims19
A system, comprising:
- a processing tool;
- a process chamber within said processing tool;
- a wafer chuck, said wafer chuck adapted to be positioned at a wafer processing position located within said process chamber and at a chuck wafer transfer position located outside of said process chamber;
- and
- at least one lift pin opening in said wafer chuck.
2 more elements
A system, comprising:
- a processing tool;
- a process chamber within said processing tool, said process chamber comprising a notched recess in a floor of said process chamber and a volume of at most 5 liters;
- a wafer chuck, said wafer chuck adapted to be positioned at a wafer processing position located within said process chamber and a chuck wafer transfer position located outside of said process chamber, wherein said wafer chuck is positioned in said notched recess when said wafer is positioned at said wafer processing position within said process chamber;
- a plurality of lift pin openings in said wafer chuck;
- a wafer lift system positioned outside of said process chamber, said wafer lift system comprising a plurality of wafer lift pins, whereby, when said wafer chuck is in said chuck wafer transfer position, each of said plurality of wafer lift pins is adapted to be extended though a corresponding one of said plurality of lift pin openings until said plurality of wafer lift pins are positioned at a lift pin wafer transfer position;
- and
- a wafer transfer system that is adapted to position a wafer to be processed in said process chamber on said plurality of wafer lift pins when said plurality of wafer lift pins are positioned in said lift pin wafer transfer position.
4 more elements
A system, comprising:
- a processing tool;
- a process chamber within said processing tool, said process chamber comprising a notched recess in a floor of said process chamber and a volume of at most 5 liters;
- a wafer chuck, said wafer chuck adapted to be positioned at a wafer processing position located within said process chamber and a chuck wafer transfer position located outside of said process chamber, wherein said wafer chuck is positioned in said notched recess when said wafer is positioned at said wafer processing position within said process chamber;
- a plurality of lift pin openings in said wafer chuck;
- a wafer lift system positioned outside of said process chamber, said wafer lift system comprising a plurality of wafer lift pins, whereby, when said wafer chuck is in said chuck wafer transfer position, each of said plurality of wafer lift pins is adapted to be extended though a corresponding one of said plurality of lift pin openings until said plurality of wafer lift pins are positioned at a lift pin wafer transfer position;
- and
- a wafer transfer system that is adapted to position a wafer to be processed in said process chamber on said plurality of wafer lift pins when said plurality of wafer lift pins are positioned in said lift pin wafer transfer position.
4 more elements
Dependencies are inferred from the claim text.