Substrate supporting apparatus
AssigneeACM Research (Shanghai) Inc.
InventorsFufa Chen, Zhiyou Fang, Jun Wu, Hui Wang, Fuping Chen, Wenjun Wang
Life of this patent
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AssigneeACM Research (Shanghai) Inc.
InventorsFufa Chen, Zhiyou Fang, Jun Wu, Hui Wang, Fuping Chen, Wenjun Wang
Estimating the term…
A substrate supporting apparatus (300) for cleaning a back side of a substrate (107) is provided. The substrate supporting apparatus (300) has a hollow shaft (319) and a rotary spindle (303). The rotary spindle (303) is set in the hollow shaft (319) and a spacing is formed between an outer wall of the rotary spindle (303) and an inner wall of the hollow shaft (319). The outer wall of the rotary spindle (303) defines a blocking wall (322) and a recess (324) to prevent particles in the spacing from entering a gas groove (325) which is formed on the hollow shaft (319) and supplies gas to a front side of the substrate (107), avoiding the particles contaminating the front side of the substrate (107), which improves the quality of semiconductor devices.
A substrate supporting apparatus, comprising:
Dependencies are inferred from the claim text.