EPI thickness tuning by pulse or profile spot heating

A processing chamber, comprising:

• an enclosure for a processing volume;
• a rotatable support within the enclosure, the rotatable support having a shaft that extends outside the enclosure,
• an energy module within the enclosure, wherein the shaft extends through the energy module;
• a rotation actuator coupled to the shaft;
• a directed energy source coupled to the enclosure;
• a controller coupled to the rotation actuator and the directed energy source, the controller configured to synchronize rotation of the rotatable support with operation of the directed energy source;
• a signaler coupled to the controller;
• and
• a plurality of signal features disposed on the shaft and grouped into a plurality of groups, the plurality of signal features operatively coupled to the signaler.

A processing chamber, comprising:

• an enclosure for a processing volume;
• a rotatable support within the enclosure, the rotatable support having a shaft that extends outside the enclosure;
• a plurality of signal features disposed on the shaft;
• an energy module within the enclosure, wherein the shaft extends through the energy module;
• one or more directed energy sources coupled to the enclosure;
• one or more signalers positioned proximate to the signal features, the one or more signalers operatively coupled to one or more of the plurality of signal features;
• and
• a controller coupled to the one or more signalers and to the one or more directed energy sources.