Substrate liquid processing apparatus, substrate liquid processing method and recording medium

A substrate liquid processing method, comprising:

• discharging a processing liquid toward a surface of a substrate from an outer nozzle provided at a position at an outside of an outer edge of the substrate;
• and
• adjusting a height position or a discharge angle of the outer nozzle by using an actuator such that the processing liquid discharged from the outer nozzle arrives at a target arrival position on the substrate,
• wherein, after a central portion of the surface of the substrate is covered with the processing liquid discharged from the outer nozzle, a discharge flow rate of the processing liquid is reduced and the height position of the outer nozzle is raised, and
• wherein the substrate liquid processing method is performed while rotating the substrate,
• when the processing liquid is being discharged from the outer nozzle to arrive at a center of the substrate, the processing liquid is discharged downwards from a movable nozzle provided at a nozzle arm such that the processing liquid arrives at a preset position, and
• the preset position is near the center of the substrate, and is located, when viewed from directly above the substrate being rotated, within a fourth quadrant of an XY orthogonal coordinate system in which a straight line including a flight trajectory of the processing liquid is defined as an Y-axis, a flight direction of the processing liquid is defined as a positive Y-axis direction, a straight line including a second vector obtained by rotating a first vector, which is started from a rotation center of the substrate and faces toward the positive Y-axis direction, by 90 degrees in a rotational direction of the substrate with respect to the rotation center of the substrate is defined as an X-axis, and a direction of the second vector is defined as a positive X-axis direction.