Methods and apparatus for supplying RF power to plasma chambers

An apparatus for matching an impedance of a process chamber, comprising:

• an impedance matching circuit configured to compensate for an impedance loading of the process chamber to allow the impedance loading to match an impedance of a radio frequency (RF) power source connected to the process chamber;
• a first filter coupled between the impedance matching circuit and the process chamber, the first filter configured as a wide bandpass filter and configured to protect the RF power source from reverse power from the process chamber;
• and
• a second filter coupled between the impedance matching circuit and the RF power source, the second filter configured as a low pass filter to reduce residual signals from reaching the RF power source.

An apparatus for providing power to a process chamber, comprising:

• a radio frequency (RF) power source configured to generate RF source energy to form a plasma in the process chamber;
• and
• an impedance matching network configured with:
• an impedance matching circuit configured to compensate for an impedance loading of the process chamber to allow the impedance loading to match an impedance of the RF power source connected to the process chamber;
• a first filter coupled between the impedance matching circuit and the process chamber, the first filter configured as a wide bandpass filter and configured to protect the RF power source from reverse power from the process chamber;
• and
• a second filter coupled between the impedance matching circuit and the RF power source, the second filter configured as a low pass filter to reduce residual signals from reaching the RF power source.