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US 10,770,260 B2Granted
Defect observation device
AssigneeHitachi High-Technologies Corporation
InventorsYuko Otani, Yohei Minekawa, Takashi Nobuhara, Nobuhiko Kanzaki, Takehiro Hirai, Miyuki Fukuda, Yuya Isomae, Kaori Yaeshima, Yuji Takagi
Life of this patent
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Abstract
A defect observation device detects a defect with high accuracy regardless of a defect size. One imaging configuration for observing an observation target on a sample is selected from an optical microscope, an optical microscope, and an electron microscope, and an imaging condition of the selected imaging configuration is controlled.
Claims14
A defect observation device comprising:
- a first imaging unit that captures a plurality of defects detected by an external inspection device;
- a control unit that corrects positional information on the defects by using an image captured by the first imaging unit;
- and
- a scanning electron microscope configured with a second imaging function and comprising a second imaging unit that captures the defects based on the corrected position information,
- wherein the first imaging unit includes a plurality of imaging portions,
- the control unit selects one of the first imaging unit and the second imaging unit as a next imaging unit for each of the defects based on the information obtained by imaging the defect by the first imaging unit,
- the control unit sets a next imaging portion of the first imaging unit from the plurality of imaging portions in the first imaging unit or an imaging condition of the second imaging unit,
- the control unit sets an accumulation frame number, an acceleration voltage, a probe current, an imaging magnification or an imaging field of view as the imaging condition of the second aging unit, and
- the control unit calculates a coordinate correction formula based on the positional information of the defect detected by the first imaging unit and the information obtained by an image acquired by the first imaging unit, and images the defect by using the second imaging unit based on the corrected positional information.
6 more elements
A defect observation device comprising:
- a first imaging unit that captures a plurality of defects detected by an external inspection device;
- a control unit that corrects positional information on the defects by using an image captured by the first imaging unit;
- and
- a scanning electron microscope configured with a second imaging function and comprising a second imaging unit that captures the defects based on the corrected position information,
- wherein the first imaging unit includes a plurality of imaging portions,
- when it is determined that coordinate detection of the defect from the image captured by the first imaging unit is disabled, the control unit sets a next imaging portion of the first imaging unit from the plurality of imaging portions of the first imaging unit based on the information obtained by the image acquired by the first imaging unit of the imaging portion determined to be incapable of detecting the coordinates of the defect, and
- the control unit calculates a coordinate correction formula based on the positional information of the defect detected by the first imaging unit and information obtained by the image acquired by the first imaging unit, and images the defect by using the second imaging unit based on the corrected positional information.
4 more elements
Dependencies are inferred from the claim text.