Developing apparatus and developing method thereof

A developing apparatus, comprising:

• a developing mechanism, wherein the developing mechanism is configured to develop substrate to be developed, and the developing mechanism comprises a transmission component and a developing liquid output component;
• a heating mechanism, wherein the heating mechanism comprises a plurality of heating units, each of the plurality of heating units corresponds to at least one developing region of the substrate to be developed, and different heating units correspond to different developing regions;
• and
• a control mechanism, wherein the control mechanism is coupled to each heating unit, and the control mechanism is configured to, when the developing mechanism develops the substrate to be developed, turn on one or more heating units corresponding to an abnormal region according to a location of the abnormal region of the substrate to be developed, so as to heat the abnormal region,
• wherein the abnormal region is a pre-acquired region of the substrate to be developed, and the abnormal region corresponds to a region that on a substrate of the same type as the substrate to be developed within which a pattern size retained after the substrate of the same type is developed is larger than a target size, in a case where the substrate of the same type is not heated by the heating mechanism;
• wherein,
• the plurality of heating units are provided above or below the transmission component, and each heating unit of the plurality of heating units is disposed independently;
• the control mechanism comprises:
• a processor, configured to acquire a target heating time according to a mapping relationship;
• the mapping relationship is a mapping relationship between a dispersion of pattern size retained after a sample substrate of the same type as the substrate to be developed is developed and a heating time of an abnormal region of the sample substrate;
• the target heating time is a heating time corresponding to a smallest dispersion;
• a memory, configured to store the mapping relationship;
• a timer, configured to control each heating unit corresponding to the abnormal region to heat the abnormal region according to the target heating time.