Back to results
US 10,768,522 B2Granted
Original plate
AssigneeToshiba Memory Corporation
InventorYumi Tanaka
Life of this patent
Estimating the term…
Abstract
An original plate includes a substrate, a pattern region in which a fine pattern is disposed on the substrate, a mark region in which a mark, including an unevenness used for alignment with a transfer receiving body on the substrate, is disposed, a first film disposed in a concave portion of the mark region and having high contrast with respect to the substrate, and a second film covering the mark region and having contrast with respect to the substrate lower than that of the first film.
Claims13
An original plate comprising:
- a substrate;
- a pattern region in which a first pattern is disposed on the substrate, the first pattern includes a first bottom surface, a first side surface and a first top surface;
- a mark region in which a second pattern is disposed on the substrate, the second pattern includes a second bottom surface, a second side surface and a second top surface;
- a first film provided on the second bottom surface of the second pattern and having high contrast with respect to the substrate;
- and
- a second film provided on the first film and the second side surface of the second pattern and having a contrast with respect to the substrate lower than that of the first film, wherein the second film contacts the second side surface.
3 more elements
An original plate comprising:
- a substrate;
- a pattern region in which a first pattern is disposed on the substrate, the first pattern includes a first bottom surface, a first side surface and a first top surface;
- a mark region in which a second pattern is disposed on the substrate, the second pattern includes a second bottom surface, a second side surface and a second top surface;
- a first film provided on the second bottom surface of the second pattern, the first film comprising at least one of the materials Ti, Ta, W, Cr, Cu, SiC, or SiF4;
- and
- a second film provided on the first film and the second side surface of the second pattern the second film comprising at least one of the materials SiO2, Ta2O5, Al2O3, TiO2, ZrO2, Y2O3, YAG, HfO2, or CaF2.
3 more elements
Dependencies are inferred from the claim text.