Multiple charged particle beam inspection apparatus and multiple charged particle beam inspection method

A multiple charged particle beam inspection apparatus comprising:

• a stage configured to be movable and place thereon an inspection substrate where a plurality of dies on each of which a same pattern has been formed are arranged in a predetermined direction;
• a die pitch acquisition circuit configured to acquire an arrangement pitch of the plurality of dies;
• a magnification control circuit configured to control, in a case of imaging the inspection substrate by using multiple charged particle beams while continuously moving the stage, magnification of the multiple charged particle beams to be a controlled magnification such that the arrangement pitch of the plurality of dies becomes a natural number (2 or greater) multiple of an imaging region cycle in the predetermined direction of a plurality of imaging regions to be individually imaged by each beam at each arrangement position of the multiple charged particle beams;
• an inspection image acquisition mechanism configured to acquire inspection images of the plurality of dies arranged on the inspection substrate, using the multiple charged particle beams whose magnification has been controlled to be the controlled magnification;
• and
• a comparison circuit configured to compare the inspection images of the plurality of dies.