Substrate processing apparatus, vaporization system and mist filter

A substrate processing apparatus comprising:

• a process chamber accommodating a substrate;
• a process gas supply system configured to supply a process gas into the process chamber;
• and
• an exhaust system configured to exhaust the process chamber;
• wherein the process gas supply system comprises:
• a vaporizer and a mist filter provided at a downstream side of the vaporizer, the mist filter comprising:
• a plurality of first plates and a plurality of second plates, each of the plurality of first plates comprising:
• a first plate portion provided with a plurality of first grooves provided on a surface thereof and a first flow path wherethrough a source in mist state flows, each of the plurality of second plates comprising:
• a second plate portion provided with a plurality of second grooves provided on a surface thereof and a second flow path wherethrough the source in mist state flows, and wherein when the plurality of first plates and the plurality of second plates are arranged alternately, the plurality of first grooves are configured to face the second flow path and the plurality of second grooves are configured to face the first flow path, such that the first flow path and the second flow path are not in-line,
• wherein each of the plurality of first grooves is one of V-shaped, rectangular, trapezoidal and U-shaped such that the surface where the plurality of first grooves are provided is uneven, and each of the plurality of second grooves is one of V-shaped, rectangular, trapezoidal and U-shaped such that the surface where the plurality of second grooves are provided is uneven, and
• wherein an opening angle of each of the plurality of first grooves ranges from 60 to 120 degrees, and an opening angle of each of the plurality of second grooves ranges from 60 to 120 degrees.

A vaporizer system comprising:

• a vaporizer;
• and
• a mist filter provided at a downstream side of the vaporizer, the mist filter comprising:
• a plurality of first plates and a plurality of second plates, each of the plurality of first plates comprising:
• a first plate portion provided with a plurality of first grooves provided on a surface thereof and a first flow path wherethrough a source in mist state flows, each of the plurality of second plates comprising:
• a second plate portion provided with a plurality of second grooves provided on a surface thereof and a second flow path wherethrough the source in mist state flows, and wherein when the plurality of first plates and the plurality of second plates are arranged alternately, the plurality of first grooves are configured to face the second flow path and the plurality of second grooves are configured to the first flow path, such that the first flow path and the second flow path are not in-line,
• wherein each of the plurality of first grooves is one of V-shaped, rectangular, trapezoidal and U-shaped such that the surface where the plurality of first grooves are provided is uneven, and each of the plurality of second grooves is one of V-shaped, rectangular, trapezoidal and U-shaped such that the surface where the plurality of second grooves are provided is uneven, and
• wherein a depth-to-width ratio of each of the plurality of first grooves ranges from 0.5 to 2, and a depth-to-width ratio of each of the plurality of second grooves ranges from 0.5 to 2.

A mist filter comprising:

• a plurality of first plates wherein each of the plurality of first plates comprises a first plate portion provided with a plurality of first grooves provided on a surface thereof and a first flow path wherethrough a source in mist state flows;
• and
• a plurality of second plates wherein each of the plurality of second plates comprises a second plate portion provided with a plurality of second grooves provided on a surface thereof and a second flow path wherethrough the source in mist state flows,
• wherein when the plurality of first plates and the plurality of second plates are arranged alternately, the plurality of first grooves are configured to face the second flow path and the plurality of second grooves are configured to face the first flow path, such that the first flow path and the second flow path are not in-line,
• wherein each of the plurality of first grooves is one of V-shaped, rectangular, trapezoidal and U-shaped such that the surface where the plurality of first grooves are provided is uneven, and each of the plurality of second grooves is one of V-shaped, rectangular, trapezoidal and U-shaped such that the surface where the plurality of second grooves are provided is uneven, and
• wherein a depth-to-width ratio of each of the plurality of first grooves ranges from 0.5 to 2, and a depth-to-width ratio of each of the plurality of second grooves ranges from 0.5 to 2.