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US 10,767,257 B2Granted
Method for removing a metal deposit arranged on a surface in a chamber
AssigneePlasma-Therm LLC
InventorsJulien Vitiello, Fabien Piallat
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Abstract
The invention relates to a method for removing a metal deposit (2) arranged on a surface (5) in a chamber (1), said method including repeatedly performing a sequence including: a) a first phase of injecting chemical species suitable for oxidizing said metal deposit (2); and b) a second phase of injecting chemical species suitable for volatilizing the oxidized metal deposit, said second phase b) being performed after the first phase a).
Claims15
A method for removing a metal deposit arranged on a surface in a chamber, said method including repeatedly performing a sequence including the following:
- a) a first phase of injecting chemical species suitable for oxidizing said metal deposit, first phase
- said injection of chemical species suitable for oxidizing said metal deposit being done in the form of one or several pulses;
- b) a second phase of injecting chemical species suitable for volatilizing the oxidized metal deposit, said second phase b) being performed after an end of the first phase a), second phase
- said injection of chemical species suitable for volatilizing the oxidized metal deposit being done in the form of one or several pulses;
- and
- adjusting the duration of the one or several pulses in phase b) to form a barrier against a passivation on the metal deposit, so that a layer of the oxidized metal deposit is not fully volatilized.
3 more elements
Dependencies are inferred from the claim text.