US 10,766,992 B2 · Resin and resist composition

Abstract

A resin containing a structural unit derived from a compound represented by the formula (aa) wherein T, R1 and Z1 are defined in the specification.

Dependent claims

A resist composition comprising

a resin comprising structural units derived from compounds represented by the formula (i) and
an acid generator;

Dependencies are inferred from the claim text.

Facts

Application

14/604,444Filed 23 Jan 2015 · division

Priority

JP 2009-14876923 Jun 2009

Published

US 2015/0132698 A114 May 2015

Granted

8 Sep 2020

Term ends

Not estimatedThe source records don’t support an estimate.

C08F 224/00
Copolymers of compounds having one or more unsaturated aliphatic radicals, each having
C08F 220/10
Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof: esters
C08F 220/1808
With acrylic or methacrylic acids: c8-acrylate, e.g. isooctyl acrylate or 2-ethylhexyl acrylate
C08F 220/1812
With acrylic or methacrylic acids: c12-acrylate, e.g. lauryl acrylate

Family

Application12/821,008Parent of this division · filed 22 Jun 2010

US 2015/0132698 A1Pre-grant publication · published 14 May 2015

US 9,051,405 B2Parent of this division

US 2010/0323296 A1Published application

US 10,766,992 B2This patent

From the US filing history. Foreign family members aren’t listed.

A resin containing a structural unit derived from a compound represented by the formula (aa) wherein T, R1 and Z1 are defined in the specification.